Leaders in the manufacture of Custom Reticles Scales Grids and Patterns:
EMI Grids
Custom Coatings
Neutral Density Filters
Resolution Targets |
Multi-density Resolution
Masks
Precision Optical Patterns
Low-reflectance Apertures |
Gaertner Wafer scan Elipsometer
The ellipsometer
is used to measure the film thickness, dielectric
constant and refractive index of thin films
by analyzing the polarized light reflected off the
surface of the wafer.
Gaertner L115S Elipsometer
Variable angle Stokes
ellipsometer with Waferscan high speed mapping capability,
measures 49 sites in 49 seconds, 2D/3D color thickness
and index maps, single layer oxides, nitrides, photoresist
film thickness range 0-60k Angstroms with 1A precision,
Manufacured June 2001 "as new", 200mm wafer stage,
HP Deskjet 842C, PC, 17" VGA monitor, Newport ESP-300
2 axis stage controller.
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