PhotoResist, Photolithography, Wafers, Coatings & Spin Casting

This bank of spinners is used to clean and then coat substrates with photoresist prior to pattern exposure. Hepa filters above the stations provide a positive flow of clean air.

Designed for the manual application of photoresist and spin-on products. It accommodates miscellaneous substrates and wafers using an assortment of chucks. It permits accurate control of spin-speed and spin time during the spin coat operation.

PhotoResist Spinner Dependent Processes

>> Protective coating for KOH etch (ProTEK) (Base process) Up
>> Spin casting Programmable Spinner (Base process) Up
>> Polyimide deposition and curing (Durimide) (Modular process) Up
>> Spin casting (Durimide) (Base process) Up
>> Spin casting (Durimide 7520) (Base process) Up
>> Polyimide deposition, patterning and curing (Durimide 7520) (Modular process)

Photolithography involves combinations of:

>> Substrate Preparation
>> Photoresist Application
>> Soft / Hard Baking
>> Exposure
>> Developing
>> Etching

as well as various other chemical treatments (thinning agents, edge-bead removal etc.) in repeated steps on the initially flat substrate.

Download Photolithography PDF from the Univesity of Washington