Industry leaders in the manufacturer
of custom reticles:
Custom multidensity resolution masks, neutral density filters and reticle patterns
products and services include multidensity resolution masks,
neutral density filters, reticle patterns, precision apertures,
calibration test targets, EMI grids, photolithographic services,
contrast test targets, and many more.
Applications for some of our products
include, satellite navigation systems, endoscopy, modulated
contrast microscope objectives, electro-optical devices, surveillance
systems, and microscopy.
Coating materials include a durable, low reflecting chrome, nickel, inconel,
gold, and protected aluminum among others. Coating attributes such as transmission,
reflectance, and resistivity may be engineered to meet specific requirements.
Our blanket photoresist coatings for semiconductor test
wafers are processed in a dedicated, class 100 cleanroom. Wafer sizes
range from 50mm diameter to 300mm diameter. Coating thicknesses range
from 0.5 microns to 10 microns.
Blanket photoresist coatings may also be patterned per customer specifications.
Coating thickness and uniformity can be certified at the customers request.
Opto-Line carries an inventory of calibration slides and resolution targets
on both glass and quartz substrates. These include 1951 USAF targets,
multidensity resolution masks and beamsplitter dot arrays. Most items
are available in both positive and negative tones.
Opto-Line International takes great pride in the high level of quality
achieved during the manufacture of product at our facility. Cleanliness
and careful handling of sensitive optical components is of paramount
importance to every employee.
Precision reticles for custom applications:
Reticles for Department of Defense Applications
Reticles for Medical Technology Applications
Reticles for Industrial Application